Micro/Nano Manufacturing & Robotics Facility
Indian Institute of Technology, Kharagpur

Nanoscribe 3D printer is installed and Running

3D printing at micro/nanoscale opens new horizons for fabrication of complex structures and subsequent applications. Two-photon polymerization based 3D lithography is attracting the researchers due to its speed, precision and resolution. 3D printing system consists of an ultrafast femto-second laser system and ultra-precision stage with x-y-z movement. Piezo-electric actuators allow very precise and small stage movements for fabrication of structures with small feature size. In addition to piezo-electric stage movement, Nanoscribe Professional GT is equipped with galvo technology which allows writing structures at much higher speeds. In galvo technology, galvanic mirror system is used to deflect the laser to scan the previously designed pattern on photoresist coated substrate at tremendous speeds in comparison to conventional technologies. With galvo technology, writing on larger areas is possible in much lesser time with nanoscale resolution. The system is a table top device, lies upon the vibration free optical table. It has a very intuitive user interface, which programs the work flow of the previously designed 3D structures. Designing of the 3D structures can be done on any compatible 3D CAD software, which can be converted to system compatible file of Nanoscribe 3D printing unit. Due to its speed, precision and resolution, this 3D printer enables the experimentation possibilities in many research fields like Micro-robotics, photonics, electrochemistry, microfluidics, tissue engineering, electronics and materials science etc. Vey innovative applications of 3D printing are emerging continuously day by day.

Major attributes of the system

  • Two-photon polymerization is compatible with various UV-curable photoresists
  • Fast and accurate 3D writing by galvo and piezo technology for scanning
  • Easy fabrication of complex 3D micro- and nanostructures with high resolution
  • Writing area up to the centimeter range
  • User-friendly software package
  • Easy CAD import via DXF, STL file format
  • Highest resolution commercially available 3D printer



LYRA3 is a dual beam system that combines a high-resolution FE-SEM column with a versatile high-performance Ga ion source FIB. LYRA3 is for preparing cross-sections, site-specific high-quality TEM lamellae and, high-resolution FIB-SEM tomography for 3D sample reconstructions. Users can profit from the excellent resolution at high beam currents which has proved to be advantageous for analytical applications such as EDX, WDX and EBSD. LYRA3 satisfies the nowadays needs for sample characterisation and microanalysis in materials science and industry. In addition, beam / ion lithography as well as circuit editing of multi-layered microelectronic devices, are tasks at which LYRA3 excels. High-throughput and powerful yet easy-to-use software allows even novice users to effortlessly implement complex FIB-SEM applications such as 3D reconstructions, serial cross-sectioning and lamellae preparation as well as correlative microscopy.

Key features

High Performance Electron Optics

Unique Wide Field Optics™ design with a proprietary Intermediate Lens (IML) offering a variety of working and displaying modes, for instance with enhanced field of view or depth of focus, etc.
Real time In-Flight Beam Tracing™ for performance and beam optimization, integrated with the well-established software Electron Optical Design. It also includes a direct and continuous control of the beam spot size and beam current.
Fully automated electron optics set-up and alignment
Fast imaging rate
A unique live stereoscopic imaging using the advanced 3D Beam Technology which opens up the micro and nano-world for an amazing 3D experience and 3D navigation.

High Performance Ion Optics

Sophisticated high performance CANION FIB system for fast and precise cross-sectioning and TEM sample preparation.
Optional ultra-high resolution COBRA-FIB column represents the highest level of technology in terms of resolution both for imaging and milling. This is one of the most precise FIB instruments for nano-engineering in the world.